Lithographic apparatus and device manufacturing method
US8553199B2 · kind B2 · utility
5Cited by
6References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 11, 2008 |
| Grant date | Oct 8, 2013 |
| Priority date | — |
| Expiry date | Dec 3, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an actuator input signal such that, during operation, the vibration of the projection system is mitigated by controlling the actuator by the input signal to exert the force to the projection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.