Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product
US8554510B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2010 |
| Grant date | Oct 8, 2013 |
| Priority date | — |
| Expiry date | Oct 31, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Movements of a lithographic apparatus include dynamic positioning errors on one or more axes which cause corresponding errors which can be measured in the applied pattern. A test method includes operating the apparatus several times while deliberately imposing a relatively large dynamic positioning error at different specific frequencies and axes. Variations in the error in the applied pattern are measured for different frequencies and amplitudes of the injected error across a frequency band of interest for a given axis or axes. Calculation using said measurements and knowledge of the frequencies injected allows analysis of dynamic positioning error variations in frequency bands correlated with each injected error frequency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.