Extreme ultraviolet light source apparatus
US8558202B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 2011 |
| Grant date | Oct 15, 2013 |
| Priority date | — |
| Expiry date | Dec 23, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0088
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.