Patent · US Active

Wavefront aberration measuring apparatus

US8558996B2 · kind B2 · utility

2Cited by

3References

8Claims

0Family size

Assignee

NIKON CORPORATION · JP

Inventor

Tatsuro Otaki · Tokyo, JP

Key dates

Filing date	Oct 5, 2012
Grant date	Oct 15, 2013
Priority date	—
Expiry date	Oct 5, 2032

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T29/49771
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A wavefront aberration measuring apparatus comprising: an illumination optical system provided to an incident side of a test lens; and a measuring optical system provided to an exit side of the test lens, the illumination optical system including an aperture stop capable of being opened and closed, and the illumination optical system being movable along an optical axis of the illumination optical system so as to adjust positions of the aperture stop and an entrance pupil of the test lens to have an optically conjugate relation with each other. Accordingly, it becomes possible to provide a wavefront aberration measuring apparatus capable of suppressing errors in measured result.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.