Patent · US Active

Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby

US8560979B2 · kind B2 · utility

6Cited by

7References

15Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

William S. Wong · Redwood City, US
Fei Liu · Wuxi, CN
Been-Der Chen · Milpitas, US
Yen-Wen Lu · Saratoga, US

Key dates

Filing date	Jul 3, 2012
Grant date	Oct 15, 2013
Priority date	—
Expiry date	Jul 3, 2032

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/36
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A multivariable solver for proximity correction uses a Jacobian matrix to approximate effects of perturbations of segment locations in successive iterations of a design loop. The problem is formulated as a constrained minimization problem with box, linear equality, and linear inequality constraints. To improve computational efficiency, non-local interactions are ignored, which results in a sparse Jacobian matrix.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.