Underlayer composition and process thereof
US8568958B2 · kind B2 · utility
7Cited by
17References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 21, 2011 |
| Grant date | Oct 29, 2013 |
| Priority date | — |
| Expiry date | Dec 19, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/094
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.