Flood exposure process for dual tone development in lithographic applications
US8568964B2 · kind B2 · utility
0Cited by
24References
14Claims
0Family size
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Key dates
| Filing date | Apr 27, 2009 |
| Grant date | Oct 29, 2013 |
| Priority date | — |
| Expiry date | Jun 16, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system for patterning a substrate using a dual tone development process is described. The method and system comprise a flood exposure of the substrate to improve process latitude for the dual tone development process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.