Patent · US Active

Dual tone development with a photo-activated acid enhancement component in lithographic applications

US8574810B2 · kind B2 · utility

2Cited by

26References

20Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Carlos A. Fonseca · Lagrangeville, US
Mark H. Somervell · Richardson, US
Steven Scheer · Austin, US
Wallace P. Printz · Austin, US

Key dates

Filing date	Dec 11, 2009
Grant date	Nov 5, 2013
Priority date	—
Expiry date	Oct 8, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70425
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method and system for patterning a substrate using a lithographic process, such as a dual tone development process, is described. The method comprises use of at least one photo-activated acid enhancement component to improve process latitude for the dual tone development process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.