Plasma processing apparatus for performing accurate end point detection
US8580077B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2009 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | May 15, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/26
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus for generating a plasma of a processing gas by applying a high frequency power to an electrode provided in a processing chamber and processing a substrate using the plasma is provided. The plasma processing apparatus includes an optical data detection unit, a data storage unit and a control unit. The optical data detection unit detects optical data when plasma processing the substrate. The data storage unit stores correlation data representing a correlation between type data corresponding to a plurality of types classified based on a type of a mask or a film to be processed disposed on the substrate and optical data to be detected by the optical data detection unit, and end point detection setting data sets, each of the setting data sets serving to detect a plasma processing end point and corresponding to one of the types.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.