Kosuke Ogasawara
12Patents
3h-index
13Co-inventors
53Inventor score
Filing activity: Feb 16, 2006 → Jun 27, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7871532B2 | Plasma processing method and post-processing method | Electricity | 5 | Expired |
| US8580077B2 | Plasma processing apparatus for performing accurate end point detection | Electricity | 4 | Active |
| US8980111B2 | Sidewall image transfer method for low aspect ratio patterns | Electricity | 3 | Active |
| US7662646B2 | Plasma processing method and plasma processing apparatus for performing accurate end point detection | Electricity | 1 | Active |
| US9564342B2 | Method for controlling etching in pitch doubling | Electricity | 1 | Active |
| US8187980B2 | Etching method, etching apparatus and storage medium | Electricity | 1 | Active |
| US11404282B2 | Method of etching film and plasma processing apparatus | Electricity | 1 | Active |
| US12217973B2 | Method of etching film and plasma processing apparatus | Electricity | 0 | Active |
| US11721522B2 | Plasma processing method and plasma processing apparatus | Electricity | 0 | Active |
| US11367590B2 | Plasma processing method and plasma processing apparatus | Electricity | 0 | Active |
| US8232207B2 | Substrate processing method | Electricity | 0 | Active |
| US9199095B2 | Particle beam irradiation system and operating method | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.