Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface
US8582082B2 · kind B2 · utility
8Cited by
9References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 6, 2009 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | Jul 24, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a level sensor for use in positioning a target portion of the substrate with respect to a focal plane of the projection system, a pair of actuators, configured to move a substrate table of the lithographic apparatus, and a controller for moving the substrate relative to the level sensor by controlling the actuators. The controller combines motions of the first and second actuators to produce a combined movement having a speed higher than a maximum speed of at least one of the actuators individually.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.