Systems and methods for inspecting specimens including specimens that have a substantially rough uppermost layer
US8582094B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 20, 2005 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | May 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9501
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for inspecting a specimen are provided. One system includes an illumination subsystem configured to direct light to the specimen at an oblique angle of incidence. The light is polarized in a plane that is substantially parallel to the plane of incidence. The system also includes a detection subsystem configured to detect light scattered from the specimen. The detected light is polarized in a plane that is substantially parallel to the plane of scattering. In addition, the system includes a processor configured to detect defects on the specimen using signals generated by the detection subsystem. In one embodiment, such a system may be configured to detect defects having a size that is less than half of a wavelength of the light directed to the specimen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.