Large scale metrology apparatus and method
US8582119B2 · kind B2 · utility
2Cited by
2References
31Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 22, 2011 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | Jan 3, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A metrology system that uses a plurality of photo-detecting targets positioned on the objects to be assembled, a plurality of rotating photo-emitting heads, a master signal generator that generates a reference RF signal, and a signal processor that determines the position of each of the targets from signals generated by each target in response to the photo-emitting heads. During operation, the reference RF signal is broadcast to the rotating photo-emitting heads and the photo-detecting targets. The RF signal is used to determine the azimuth of the heads relative to a zero reference position to a high degree of accuracy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.