Block mask decomposition for mitigating corner rounding
US8584060B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 16, 2012 |
| Grant date | Nov 12, 2013 |
| Priority date | — |
| Expiry date | Nov 16, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for decomposing design shapes in a design level into a plurality of target design levels is provided. Design shapes including first-type edges and second-type edges having different directions is provided for a design level. Inner vertices are identified and paired up. Vertices are classified into first-type vertices and second-type vertices. First mask level shapes are generated so as to touch the first-type vertices, and second mask level shapes are generated so as to tough the second-type vertices. Cut mask level shapes are generated to touch each first-type edges that are not over a second-type edge and to touch each second-type edges that are not over a first-type edge. Suitable edges are sized outward to ensure overlap among the various shapes. The design shapes are thus decomposed into first mask level shapes, the second mask level shapes, and the cut mask level shapes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.