William Brearley
17Patents
5h-index
25Co-inventors
66Inventor score
Filing activity: Jun 20, 1994 → Jul 16, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6531069B1 | Reactive Ion Etching chamber design for flip chip interconnections | Electricity | 109 | Expired |
| US6293457A | Integrated method for etching of BLM titanium-tungsten alloys for CMOS devices with copper metallization | Electricity | 39 | Expired |
| US5735452A | Ball grid array by partitioned lamination process | Electricity | 25 | Expired |
| US6099935A | Apparatus for providing solder interconnections to semiconductor and electronic packaging devices | Emerging Cross-Sectional Technologies | 20 | Expired |
| US5722579A | Bottom-surface-metallurgy rework process in ceramic modules | Electricity | 10 | Expired |
| US6149048A | Apparatus and method for use in manufacturing semiconductor devices | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7645700B2 | Dry etchback of interconnect contacts | Electricity | 4 | Active |
| US8584060B1 | Block mask decomposition for mitigating corner rounding | Physics | 3 | Active |
| US7323410B2 | Dry etchback of interconnect contacts | Electricity | 2 | Expired |
| US6448169B1 | Apparatus and method for use in manufacturing semiconductor devices | Emerging Cross-Sectional Technologies | 2 | Expired |
| US9607268B2 | Optical rule checking for detecting at risk structures for overlay issues | Physics | 0 | Active |
| US5690784A | Ion milling end point detection method and apparatus | Electricity | 0 | Expired |
| US11163934B2 | Optical rule checking for detecting at risk structures for overlay issues | Physics | 0 | Active |
| US10395002B2 | Optical rule checking for detecting at risk structures for overlay issues | Physics | 0 | Active |
| US10339261B2 | Optical rule checking for detecting at risk structures for overlay issues | Physics | 0 | Active |
| US9330223B2 | Optical rule checking for detecting at risk structures for overlay issues | Physics | 0 | Active |
| US11182531B2 | Optical rule checking for detecting at risk structures for overlay issues | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.