Integrated circuit using a superjunction semiconductor device
US8587055B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 23, 2007 |
| Grant date | Nov 19, 2013 |
| Priority date | — |
| Expiry date | Nov 10, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/151
Abstract
In an embodiment, an apparatus includes a source region, a gate region and a drain region supported by a substrate, and a drift region including a plurality of vertically extending n-wells and p-wells to couple the gate region and the drain region of a transistor, wherein the plurality of n-wells and p-wells are formed in alternating longitudinal rows to form a superjunction drift region longitudinally extending between the gate region and the drain region of the transistor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.