Methods relating to immersion lithography and an immersion lithographic apparatus
US8587762B2 · kind B2 · utility
12Cited by
18References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 25, 2008 |
| Grant date | Nov 19, 2013 |
| Priority date | — |
| Expiry date | Jul 11, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.