System and method to optimize extreme ultraviolet light generation
US8598552B1 · kind B1 · utility
14Cited by
7References
20Claims
0Family size
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Key dates
| Filing date | Jul 13, 2012 |
| Grant date | Dec 3, 2013 |
| Priority date | — |
| Expiry date | Aug 10, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/009
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-loop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position is achieved, EUV generation is optimized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.