Polymer composition and photoresist comprising the polymer
US8603728B2 · kind B2 · utility
3Cited by
6References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 29, 2012 |
| Grant date | Dec 10, 2013 |
| Priority date | — |
| Expiry date | May 29, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A copolymer comprises the polymerized product of a base-soluble monomer of formula (I):wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising β-diketone, β-ester-ketone, β-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.