Method and an apparatus of an inspection system using an electron beam
US8604430B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 2012 |
| Grant date | Dec 10, 2013 |
| Priority date | — |
| Expiry date | Feb 6, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31766
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The inspection apparatus disclosed generates an electron beam, an acceleration electrode accelerates the electron beam, a convergence lens converges the electron beam, an electron beam deflector scans the beam over a sample, an objective lens converges the electron beam on the sample, a detector located between the sample and the objective lens detects charged particles emitted from the sample, a power supply applies a retarding voltage to the sample for decelerating the electron beam to the sample, an electrode is disposed between the objective lens and the sample, and a voltage is generated between the sample and the electrode by said electrode, the voltage being determined depending on the sample. The apparatus solves problems encountered in conventional inspection systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.