Patent · US Active

Method and system for detecting particle contamination in an immersion lithography tool

US8605250B2 · kind B2 · utility

3Cited by

2References

21Claims

0Family size

Assignee

GlobalFoundries Inc. · KY

Inventors

Rolf Seltmann · Dresden, DE
Rene Wirtz · Stuttgart, DE

Key dates

Filing date	Mar 26, 2010
Grant date	Dec 10, 2013
Priority date	—
Expiry date	Jan 27, 2032

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In an immersion lithography tool, the status of the immersion hood surface may be estimated on the basis of an inline detection system that generates optical measurement data. For example, a digital imaging system may be implemented in order to obtain optical measurement data without requiring exposure of the interior of the lithography tool to ambient air. In other cases, other optical measurement techniques, such as FTIR and the like, may be applied.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.