Projection system with compensation of intensity variations and compensation element therefor

US8605257B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Patrick Scheible · Aalen, DE
• Alexandra Pazidis · Aalen, DE
• Reiner Garreis · Aalen, DE
• Michael Totzeck · Schwäbisch Gmünd, DE
• Heiko Feldmann · Aalen, DE
• Paul Graeupner · Aalen, DE
• Hans-Juergen Rostalski · Oberkochen, DE
• Wolfgang Singer · Aalen, DE

Key dates

• Filing date: Jun 3, 2005
• Grant date: Dec 10, 2013
• Expiry date: Oct 12, 2027

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70308
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.