Method for inspecting localized image and system thereof
US8606017B1 · kind B1 · utility
3Cited by
6References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2011 |
| Grant date | Dec 10, 2013 |
| Priority date | — |
| Expiry date | Feb 22, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V10/764
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A plurality of points with identical geometric feature is compared with their SEM characteristic features to inspect defect in a localized image. Original design information is included in the geometric feature such that absolute compare can be performed in this inspection method. Further, this method can also be applied to the localized image with or without repeated or redundant pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.