Substrate cleaning apparatus and method for determining timing of replacement of cleaning member
US8608858B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 13, 2005 |
| Grant date | Dec 17, 2013 |
| Priority date | — |
| Expiry date | Aug 5, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02096
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate cleaning apparatus includes a cleaning apparatus 10 including an abutting member which is to be pressed against a cleaning member to clean the cleaning member, a drive control device for controllably driving the abutting member, and a cleaning tank which contains a cleaning liquid and allows a portion of abutment between the cleaning member and the abutting member to be impregnated with the cleaning liquid. The substrate cleaning apparatus also includes an image capturing device which captures a surface image of the cleaning member and an image processing device. A surface condition of the cleaning member is monitored to determine the timing of replacement of the cleaning member. The substrate cleaning apparatus further includes a measurement device which measures the number of particles and/or a concentration of a component in the cleaning liquid in the cleaning tank. Results of measurement by the measurement device are fed back to a drive control device, to thereby prevent contamination of the cleaning member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.