Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8610873B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2009 |
| Grant date | Dec 17, 2013 |
| Priority date | — |
| Expiry date | Jun 21, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/52
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.