Reticle pod

US8613359B2 · kind B2 · utility

Assignee

• ENTEGRIS, INC. · US

Inventors

• Steven P. Kolbow · Chaska, US
• Kevin McMullen · Shorewood, US
• Anthony Mathius Tieben · Jordan, US
• Matthew Kusz · Minneapolis, US
• Christian Andersen
• Huaping Wang · Eden Prairie, US
• Michael Cisewski · Hutchinson, US
• Michael L. Johnson · Molalla, US
• David L. Halbmaier · Shorewood, US
• John Lystad · Bloomington, US

Key dates

• Filing date: Jul 30, 2012
• Grant date: Dec 24, 2013
• Expiry date: Jul 30, 2032

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67386
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.