Showerhead assembly for plasma processing chamber
US8617349B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2010 |
| Grant date | Dec 31, 2013 |
| Priority date | — |
| Expiry date | Mar 22, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T408/03
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A showerhead for a plasma process apparatus for processing substrates, comprising a showerhead body comprising a top plate and a bottom plate defining a cavity in between; a gas inlet formed in the top plate; a perforated plate positioned between the top plate and the bottom plate and dissecting the cavity into an upper gas compartment and a lower gas compartment; and, wherein the bottom plate comprises a plurality of elongated diffusion slots on its lower surface and a plurality of diffusion holes on its upper surface, each of the diffusion holes making fluid connection from the lower gas compartment to more than one of the diffusion slots.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.