Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
US8617788B2 · kind B2 · utility
2Cited by
1References
13Claims
0Family size
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Key dates
| Filing date | Mar 30, 2010 |
| Grant date | Dec 31, 2013 |
| Priority date | — |
| Expiry date | May 24, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition, wherein when a film having a film thickness of 100 nm is formed from the actinic ray-sensitive or radiation-sensitive resin composition, the film has a transmittance of 55 to 80% for light at a wavelength of 193 nm, and a pattern forming method using the composition are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.