Patent · US Active

Charged particle beam apparatus

US8618480B2 · kind B2 · utility

3Cited by

4References

29Claims

0Family size

Assignee

HERMES MICROVISION INC. · TW

Inventors

Weiming Ren · San Jose, US
Xiaoli Guo · Beijing, CN
Xuedong Liu · San Jose, US
Zhongwei Chen · San Jose, US

Key dates

Filing date	Mar 22, 2013
Grant date	Dec 31, 2013
Priority date	—
Expiry date	Mar 22, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2449
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The present invention provides a charged particle beam apparatus which employs LVSEM to inspect sample surface with a throughput much higher than the prior art. The high throughput is realized by providing a probe current and a FOV both several times of those of the prior art. Accordingly several means are proposed to avoid obvious degradation of image resolution due to the increases in Coulomb effect and geometric aberrations, and increase efficiency and uniformity of secondary charged particle collection.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.