Methods of directed self-assembly, and layered structures formed therefrom

US8623458B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Joy Cheng · San Jose, US
• Matthew E. Colburn · Hopewell Junction, US
• Stefan Harrer · Hampton, AU
• William D. Hinsberg · Fremont, US
• Steven J. Holmes · Colchester, US
• Ho-Cheol Kim · San Jose, US
• Daniel P. Sanders · San Jose, US

Key dates

• Filing date: Dec 18, 2009
• Grant date: Jan 7, 2014
• Expiry date: Oct 25, 2032

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B82Y40/00
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A layered structure comprising a self-assembled material is formed by a method that includes forming a photochemically, thermally and/or chemically treated patterned photoresist layer disposed on a first surface of a substrate. The treated patterned photoresist layer comprises a non-crosslinked treated photoresist. An orientation control material is cast on the treated patterned photoresist layer, forming a layer containing orientation control material bound to a second surface of the substrate. The treated photoresist and, optionally, any non-bound orientation control material are removed by a development process, resulting in a pre-pattern for self-assembly. A material capable of self-assembly is cast on the pre-pattern. The casted material is allowed to self-assemble with optional heating and/or annealing to produce the layered structure.