Method for making photomask layout
US8627242B1 · kind B1 · utility
7Cited by
33References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2013 |
| Grant date | Jan 7, 2014 |
| Priority date | — |
| Expiry date | Jan 30, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for making a photomask layout is provided. A first graphic data of a photomask is provided, wherein the first graphic data includes a first line with a first line end target, a second line with a second line end target and a hole, the first line is aligned with the second line, and the first line, the second line and the hole partially overlap with each other. Thereafter, a retarget step is performed to the first graphic data to obtain a second graphic data, wherein the retarget step includes moving the first line end target and the second line end target in opposite directions away from each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.