Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table
US8634052B2 · kind B2 · utility
3Cited by
2References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 27, 2007 |
| Grant date | Jan 21, 2014 |
| Priority date | — |
| Expiry date | Jan 7, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.