Apparatus and method to control vacuum at porous material using multiple porous materials
US8634055B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 2, 2010 |
| Grant date | Jan 21, 2014 |
| Priority date | — |
| Expiry date | Jun 27, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is projected onto the object. A first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. A second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber. A hydrophobic porous member is provided between the first chamber and a vacuum system that supplies a low pressure to the first chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.