Patent · US Active

Method of CVD-depositing a film having a substantially uniform film thickness

US8652573B2 · kind B2 · utility

0Cited by

3References

27Claims

0Family size

Assignee

ASM International N.V. · NL

Inventors

Maarten Stokhof · Leuven, BE
Hessel Sprey · Kessel-Lo, BE
Tatsuya Yoshimi · Almere, NL
Bert Jongbloed · Oud-Heverlee, BE
Noureddine Adjeroud · Almere, NL

Key dates

Filing date	Jul 14, 2011
Grant date	Feb 18, 2014
Priority date	—
Expiry date	Mar 11, 2032

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/45523
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Method of depositing a film having a substantially uniform thickness by means of chemical vapor deposition, comprising:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.