Pattern inspection method, pattern inspection program, and electronic device inspection system
US8653456B2 · kind B2 · utility
2Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2011 |
| Grant date | Feb 18, 2014 |
| Priority date | — |
| Expiry date | Feb 9, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24495
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
It is an object of the present invention to provide a technique capable of accurately inspecting a circuit pattern in which the contrast of an observation image is not clear, like a circuit pattern having a multilayer structure. A pattern inspection method according to the present invention divides a circuit pattern using the brightness of a reflection electron image and associates the region in the reflection electron image belonging to each division with the region in a secondary electron image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.