Substrate processing apparatus
US8662811B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2010 |
| Grant date | Mar 4, 2014 |
| Priority date | — |
| Expiry date | Mar 14, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67778
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Manufacturing cost or energy consumption of a substrate processing apparatus can be reduced. The substrate processing apparatus includes a substrate loading/unloading unit (a substrate transit chamber 12) that transfers a substrate 2 accommodated in a carrier 3; a substrate transfer chamber 14 (25) communicating with the substrate loading/unloading unit via a substrate loading/unloading port 37 (39); a plurality of substrate processing chambers 15 to 24 (26 to 35) arranged along the substrate transfer chamber 14 (25); a substrate transfer device 36 (38) provided in the substrate transfer chamber 14 (25) and configured to transfer the substrate 2 between the substrate loading/unloading unit and the substrate processing chambers 15 to 24 (26 to 35); and a clean air flowing unit 41 (42) that allows clean air to flow along the substrate transfer chamber 14 (25).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.