Method of removing liquid from a barrier structure
US8668778B2 · kind B2 · utility
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101References
13Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 9, 2012 |
| Grant date | Mar 11, 2014 |
| Priority date | — |
| Expiry date | Oct 9, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67051
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides methods of removing liquid from a barrier structure in the context of treating microelectronic workpieces with one or more treatment materials, including liquids, gases, fluidized solids, dispersions, combinations of these, and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.