Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof
US8679252B2 · kind B2 · utility
2Cited by
22References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 23, 2005 |
| Grant date | Mar 25, 2014 |
| Priority date | — |
| Expiry date | Jan 23, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67069
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An actively heated aluminum baffle component such as a thermal control plate or baffle ring of a showerhead electrode assembly of a plasma processing chamber has an exposed outer aluminum oxide layer which is formed by an electropolishing procedure. The exposed outer aluminum oxide layer minimizes defects and particles generated as a result of differential thermal stresses experienced by the aluminum component and outer aluminum oxide layer during plasma processing compared to an identically shaped component having a Type III anodized surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.