Fine tuning highly resistive substrate resistivity and structures thereof
US8679863B2 · kind B2 · utility
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22Claims
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Key dates
| Filing date | Mar 15, 2012 |
| Grant date | Mar 25, 2014 |
| Priority date | — |
| Expiry date | Mar 15, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods are provided for fine tuning substrate resistivity. The method includes measuring a resistivity of a substrate after an annealing process, and fine tuning a subsequent annealing process to achieve a target resistivity of the substrate. The fine tuning is based on the measured resistivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.