Dark-field defect inspecting method, dark-field defect inspecting apparatus, aberration analyzing method, and aberration analyzing apparatus
US8681328B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 20, 2010 |
| Grant date | Mar 25, 2014 |
| Priority date | — |
| Expiry date | Jul 1, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8822
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
By including an illumination system and a detection system, an information collecting function of monitoring an environment, such as temperature and atmospheric pressure, and an apparatus state managing function having a feedback function of comparing the monitoring result and a design value, a theoretical calculation value or an ideal value derived from simulation results and calibrating an apparatus so that the monitoring result is brought close to the ideal value, a unit for keeping the apparatus state and apparatus sensitivity constant is provided. A control unit 800 is configured to include a recording unit 801, a comparing unit 802, a sensitivity predicting unit 803, and a feedback control unit 804. In the comparing unit 802, the monitoring result transmitted from the recording unit 801 and an ideal value stored in a database 805 are compared with each other. When a difference between the ideal value and the monitoring result exceeds a predetermined threshold, the feedback control unit 804 corrects the illumination system and the detection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.