Compositions of neutral layer for directed self assembly block copolymers and processes thereof

US8691925B2 · kind B2 · utility

Assignee

• AZ Electronic Materials (Luxembourg) S.A.R.L. · LU

Inventors

• Hengpeng Wu
• Yi Cao · Parsippany, US
• SungEun Hong · Berkeley Heights, US
• Jian Yin · Bound Brook, US
• Margareta Paunescu · Clinton, US
• Mark Neisser · Whitehouse Station, US
• Guanyang Lin · Whitehouse Station, US

Key dates

• Filing date: Sep 23, 2011
• Grant date: Apr 8, 2014
• Expiry date: Dec 22, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/2037
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3)where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl and C1-C8 fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, C1-C8 alkyl and a C1-C8 fluoroalkyl and m ranges from 1 to 3.