Charged particle beam inspection method
US8692214B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 12, 2009 |
| Grant date | Apr 8, 2014 |
| Priority date | — |
| Expiry date | Feb 14, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/228
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An imaging method and apparatus for forming images of substantially the same area on a sample for defect inspection within the area are disclosed. The disclosed method includes line-scanning the charged particle beam over the area to form a plurality of n*Y scan lines by repeatedly forming a group of n scan lines for Y times. During the formation of each group of n scan lines, an optical beam is, from one line scan to another, selectively illuminated on the area prior to or simultaneously with scanning of the charged particle beam. In addition, during the formation of each group of n scan lines, a condition of illumination of the optical beam selectively changes from one line scan to another. The conditions at which individual n scan lines are formed are repeated for the formation of all Y groups of scan lines.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.