Electrochromic devices
US8693078B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 1, 2012 |
| Grant date | Apr 8, 2014 |
| Priority date | — |
| Expiry date | Sep 26, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2001/1536
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention contemplates integrating laser scribing/patterning the component layers of electrochromic devices by directly removing (ablating) the material of the component layers. To minimize redeposition of laser ablated material and particulate formation on device surfaces a number of approaches may be used: (1) ablated material generated by the focused laser patterning may be removed by vacuum suction and/or application of an inert gas jet in the vicinity of the laser ablation of device material; (2) spatial separation of the edges of layers and patterning of lower layers prior to deposition of upper layers; and (3) the laser patterning step may be performed by a laser beam focused directly on the deposited layers from above, by a laser beam directed through the transparent substrate, or by a combination of both.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.