Method and system for determining a suppression factor of a suppression system and a lithographic apparatus
US8711325B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 6, 2008 |
| Grant date | Apr 29, 2014 |
| Priority date | — |
| Expiry date | Sep 4, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70908
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.