Fluid handling structure, a lithographic apparatus and a device manufacturing method
US8711326B2 · kind B2 · utility
1Cited by
3References
20Claims
0Family size
Assignee
Inventors
- Ronald Van Der Ham
- Martinus Hendrikus Antonius Leenders
- Johannes Catharinus Hubertus Mulkens
- Richard Moerman
- Michel Riepen
- Sergei Shulepov
- Koen Steffens
- Jan Willem Cromwijk
- Johanna Antoinette Maria Sondag-Huethorst
- Marco Baragona
- Robertus Leonardus Maria In 'T Groen
- Ralph Theodorus Hubertus Maessen
- Jacob Marinus Jan Den Toonder
- Milica Kovacevic-Milivojevic
Key dates
| Filing date | May 2, 2011 |
| Grant date | Apr 29, 2014 |
| Priority date | — |
| Expiry date | Jun 5, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.