Lithographic apparatus and device manufacturing method
US8711330B2 · kind B2 · utility
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14Claims
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Key dates
| Filing date | May 6, 2011 |
| Grant date | Apr 29, 2014 |
| Priority date | — |
| Expiry date | Apr 17, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70333
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.