Surface active additive and photoresist composition comprising same

US8722825B2 · kind B2 · utility

Assignee

• Rohm and Haas Electronic Materials LLC · US

Inventors

• Deyan Wang · Hudson, US
• Chunyi Wu · Shrewsbury, US
• Cong Liu · Lanzhou, CN
• Gerhard Pohlers · Needham, US
• Cheng-Bai Xu · Upton, US
• George G. Barclay · Jefferson, US

Key dates

• Filing date: May 29, 2012
• Grant date: May 13, 2014
• Expiry date: May 29, 2032

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08F220/387
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II):wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, or C3-20 heterocycloalkyl, wherein each Rc is separate or at least one Rc is attached to an adjacent Rc.