Inspection apparatus for lithography
US8724087B2 · kind B2 · utility
86Cited by
2References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 8, 2009 |
| Grant date | May 13, 2014 |
| Priority date | — |
| Expiry date | Jan 10, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9501
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A scatterometer configured to measure a property of a substrate, includes a radiation source configured to provide a radiation beam; and a detector configured to detect a spectrum of the radiation beam reflected from a target (30) on the surface of the substrate (W) and to produce a measurement signal representative of the spectrum. The apparatus includes a beam shaper (51, 53) interposed in the radiation path between the radiation source and the detector, the beam shaper being configured to adjust the cross section of the beam dependent on the shape and/or size of the target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.