Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure
US8730447B2 · kind B2 · utility
3Cited by
6References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2009 |
| Grant date | May 20, 2014 |
| Priority date | — |
| Expiry date | Nov 21, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/52
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.