Method and apparatus for electron pattern imaging
US8735815B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 24, 2013 |
| Grant date | May 27, 2014 |
| Priority date | — |
| Expiry date | Jun 24, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24475
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for electron pattern imaging includes: a device for converting electron patterns into visible light provided to receive an electron backscatter diffraction (EBSD) pattern from a sample and convert the EBSD pattern to a corresponding light pattern; a first optical system positioned downstream from the device for converting electron patterns into visible light for focusing the light pattern produced by the device for converting electron patterns into visible light; a camera positioned downstream from the first optical system for obtaining an image of the light pattern; an image intensifier positioned between the device for converting electron patterns into visible light and the camera for amplifying the light pattern produced by the device for converting electron patterns into visible light; and a device positioned within the system for protecting the image intensifier from harmful light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.